| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D277-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C317-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-74 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D277-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C317-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
1993-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100296213-B1 |
| titleOfInvention |
Sulfonic acid esters and radiosensitive mixtures prepared using the same and radiosensitive recording materials comprising the same |
| abstract |
The present invention is directed to sulfonic acid esters and prepared using the same: a) general formula [R 1 -CR 2 (CF 3 ) —O—SO 2 —] n R 3 or R 1 [—CR 2 (CF 3 ) —O Compounds which form a strong acid upon irradiation, represented by the sulfonic acid ester of -SO 2 -R 3 ] m , b) compounds with one or more acid degradable COC or CO-Si bonds (for positive functional mixtures) or two or more Compounds having acid crosslinkable groups (for negative functional mixtures) and c) radiation sensitive, positive functional or negative functional compounds which comprise a binder which is insoluble in water but soluble or at least swellable in an aqueous alkali solution. This mixture exhibits unexpectedly high sensitivity and improved resolution in the DUV range. It is particularly advantageous that this mixture is insensitive to changes in storage time between exposure and post-heating. |
| priorityDate |
1993-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |