http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100293041-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-53 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1993-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100293041-B1 |
| titleOfInvention | Polymers with N, N-disubstituted sulfonamide pendant groups and uses thereof |
| abstract | The invention is formula R 1 -SO 2 -N (CO-OR 2 ) -R 3 -O-CO-CR 4 = CH 2 and R 1 -N (CO-OR 2 ) -SO 2 -R 3 -O Monomer of —CO—CR 4 ═CH 2 , wherein R 1 is (C 1 -C 20 ) alkyl, (C 3 -C 10 ) cycloalkyl, (C 6 -C 14 ) aryl or (C 7 -C 20 Is an aralkyl radical, wherein each methylene group in the alkyl containing radicals is optionally substituted by a hetero atom, and R 2 is (C 3 -C 11 ) alkyl, (C 3 -C 11 ) alkenyl or (C 7 -C 11 ) aralkyl, R 3 is unsubstituted or substituted (C 1 -C 6 ) alkyl, (C 3 -C 6 ) cycloalkyl, (C 6 -C 14 ) aryl or (C 7 -C 20 ) an aralkyl radical, R 4 is a hydrogen atom or a methyl group.n n n The invention also relates to the general formula -R 3 -N (CO-OR 2 ) -SO 2 -R 1 (I) and / or -R 3 -SO 2 -N (CO-OR 2 ) -R 1 (II) A polymer comprising at least 5 mol% of units having a pendant group, a radiation comprising a compound (a) which forms an acid under the influence of actinic radiation, and an acid decomposable compound having a higher solubility of its decomposition product in an aqueous alkaline developer than the starting compound. A recording material comprising a sensitive compound (b), wherein the acid degradable compound (b) is a polymer of this type, and a support and a radiation sensitive layer.n n n The mixtures according to the invention are particularly suitable for producing offset printing plates and photoresists. |
| priorityDate | 1992-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 208.