http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100285188-B1

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filingDate 1998-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2001-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2001-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100285188-B1
titleOfInvention Chemical amplification resist
abstract The disclosed contents not only prevent the resist pattern from developing into a T-shaped shape, but also have excellent resolution, depth of focus and dimensional accuracy, and increase the dissolution rate and exposure dose dependence, and together with PAG, a chemical amplification resist It relates to a chemically amplified resist which is a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weights, which are used as basic polymers. The preferred molecular weight ratio of this mixture is 1: 5 to 1:20, and the mixing ratio is preferably about 10 to 30 parts by weight of the low molecular weight polymer relative to 100 parts by weight of the low molecular weight polymer relative to 100 parts by weight of the high molecular weight polymer.
priorityDate 1997-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 32.