http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100273821-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1993-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100273821-B1 |
| titleOfInvention | Photoresist composition |
| abstract | The present invention provides a negative photoresist composition comprising an alkali-soluble resin, a crosslinking agent and at least one sulfonic acid ester photo-induced acid precursor represented by the following general formula (I) and an alkali-soluble resin, a dissolution inhibitor and the following general Provided is a positive photoresist composition comprising at least one sulfonic acid ester photo-derived acid precursor represented by formula (I).n n n n n n n n [In the above formula,n n n R 1 represents an optionally substituted arylene, alkylene or alkenylene group,n n n R 2 is an optionally substituted alkyl or aryl group, provided that when the R 2 is an alkyl or aryl group containing a substituent, the aforementioned substituents cannot be fluorine atoms.]n n n The negative type and positive type photoresist compositions of the present invention not only have excellent performances such as heat resistance, film thickness preservation rate, coating characteristics, profile, etc., but also have excellent sensitivity in an exposure part using far ultraviolet rays, including an excimer laser light source. And the resolution are suitable for use in far ultraviolet lithography and the like. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100636663-B1 |
| priorityDate | 1992-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 68.