| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1998-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1df85eaaecb43cea07de301f902d62d2 |
| publicationDate |
2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100261225-B1 |
| titleOfInvention |
Alicyclic Cyclopolymer and Chemically Amplified Resist Composition Comprising the Same |
| abstract |
An alicyclic cyclopolymer and a chemically amplified resist composition comprising the same are provided. The present invention provides a polymer having the following formula for use in chemically amplified resists.n n n n n n n n M / (m + n) = 0.1-0.9 in a formula.n n n The resist composition according to the present invention comprises the polymer and a photoacid generator (PAG). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100362935-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100362936-B1 |
| priorityDate |
1998-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |