http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100261151-B1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2b06cd22ab3bfbdca17825e5d731dee1 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
filingDate | 1998-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70688379841f88b3ca041b9f734a15 |
publicationDate | 2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100261151-B1 |
titleOfInvention | How to Form Contact Holes |
abstract | The present invention relates to a method of forming a contact hole for preventing cracking of an SOG layer without an additional process such as an etch back process of a spin on glass (SOG) layer.n n n The method of forming a contact hole of the present invention includes forming a metal layer on a portion of an insulating substrate, forming a first insulating film, an SOG layer, and a second insulating film on an insulating substrate including the metal layer, and forming a second layer on an upper portion of the metal layer. First etching the insulating film to a predetermined thickness, and etching the second insulating film, the SOG layer, and the first insulating film using the first etched second insulating film as a mask to form a contact hole on the metal layer. Characterized in that made. |
priorityDate | 1998-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
---|---|
isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6517 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555680 |
Total number of triples: 17.