| abstract |
The present invention provides a chemically amplified resist composition comprising a polymer of Formula 1 and a Photoacid Generator (PAG).n n n [Formula 1]n n n n n n n n Wherein R 1 and R 2 are C 1 to C 10 aliphatic hydrocarbons having hydroxy or carboxylic acid groups, R 3 is hydrogen or methyl, R 4 is t-butyl or tetrahydropyranyl, m and n are Is an integer.n n n The present invention also provides a chemically amplified resist composition comprising a polymer of formula (2) and PAG.n n n [Formula 2]n n n n n n n n Wherein x is a C 5 to C 8 cyclic or alicyclic compound, R 1 is selected from the group consisting of hydrogen and methyl, R 2 is t-butyl, tetrahydro While it is selected from the group which consists of pyranyl (Tetrahydropyranyl) and adamantyl (Adamantyl), m and n are integers n / (m + n) = 0.1-0.5.n n n According to the present invention, it is possible to use a developer used in a conventional method as a developer at the time of development, to have excellent etching resistance, and to provide excellent adhesion to the film quality. |