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filingDate 1998-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eec9231347d614a00778e9eae77ec2a
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publicationDate 2000-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100260771-B1
titleOfInvention Polymer for photosensitive resin composition and its manufacturing method
abstract PURPOSE: The present invention provides a polymer for a photosensitive resin composition which can be stably adhered to the surface of a panel by using a non-chromium-based diazo-based photosensitive agent to improve sensitivity and soil pollution, and to improve adhesion of phosphors. To provide.n n n Composition: A vinyl silane is added to acrylamide and N, N-dimethylacrylamide monomer to obtain a PDMA water-soluble polymer represented by the following formula (1).n n n Formula 1n n n n n n n n EFFECT: The present invention is used with a non-chromium-based photosensitive agent that does not contain chromium, and thus, even when discarded after use, it does not cause soil contamination and does not react with the surface treatment material of the phosphor so that the physical properties are very stable, thereby controlling the dot width of the phosphor. And the sensitivity can be easily adjusted, and the adhesion of the phosphor is improved, so that a stable fluorescent pattern can be obtained even when used with a diazo photosensitive agent.
priorityDate 1998-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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