| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 |
| filingDate |
1996-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f7a63355a9f1efe7c33636d12f0de75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3d69c4ffbbdbd259094e39eeaea1975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58893742959810b104d93e161187e824
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01318a3fc4560887c53e081013720394 |
| publicationDate |
2000-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100257634-B1 |
| titleOfInvention |
A chemically amplified positive photoresist composition |
| abstract |
The present invention relates to a novel chemically amplified positive photoresist composition which is used for photolithographic patterning in the fabrication of a semiconductor device and which is excellent in the antireflection effect in pattern exposure, An esterification reaction between a specific phenolic compound and naphthoquinone-1,2-diazidesulfonic acid, as well as conventional components such as an acid generator capable of reacting with an acid, and a resin component capable of increasing solubility in an aqueous alkali developing solution in the presence of an acid And a unique halation inhibitor which is a product. |
| priorityDate |
1995-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |