http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100255164-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 1993-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5819bac3d46ceb02c6673fcc34d08c95 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69cd132df8df53454ff93c02eb605e16 |
| publicationDate | 2000-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100255164-B1 |
| titleOfInvention | Polysilicon / oxide etching method of semiconductor device |
| abstract | The present invention relates to a method for etching polysilicon / oxide of a semiconductor device, and to etch polysilicon and oxide in a structure in which polysilicon is stacked on an oxide during a manufacturing process of a semiconductor device, By depositing and hardening the oxide to be applied as an etch mask on the stacked polysilicon, the hardened oxide is used as a hard mask (Hard Mask) using the existing oxide etching equipment (Oxide Etcher) only the laminated polysilicon below and By etching the oxides, the oxides applied as hard masks are simultaneously etched, so that polysilicon of semiconductor devices can improve product yield and reliability by using a single etching device and also reducing particles generated by the etching process. A method of etching an oxide is described. |
| priorityDate | 1993-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID190217 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559572 |
Total number of triples: 15.