http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100252374-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1996-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c9cc40d9aa2f6a7291b15f205d8469e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ebe8b8d3fdcf42788496d0b15ea1ec3 |
| publicationDate | 2000-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100252374-B1 |
| titleOfInvention | Resist Pattern Formation Method |
| abstract | A polymer or copolymer comprising a repeating unit having a protected alkali-soluble group and its protecting group is detached by an acid to make the compound alkali-soluble, and a resist containing a acid generator which generates an acid by radiation exposure. After application on the plate, the formed resist film is pre-fired, and the resist film on the substrate is selectively exposed, and after the post-firing, the latent image formed in the exposure process includes an aqueous solution of an ammonium compound or a morpholine compound or an alcohol solution. According to this method, a crack and peeling of a pattern can be suppressed at the time of formation of a resist pattern. This method of forming a resist pattern includes developing with a developer. |
| priorityDate | 1995-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 91.