http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100248561-B1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S414-141 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67282 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65G49-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65G47-90 |
filingDate | 1993-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb949738ce0c053dc6490c1e15493b62 |
publicationDate | 2000-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100248561-B1 |
titleOfInvention | Probe System |
abstract | The probe system includes a wafer accommodating part for storing a semiconductor wafer as an object to be inspected, a plurality of probe devices for measuring wafers, a marking device for marking defective parts of the wafer, and a repair for repairing defective parts of the wafer. An apparatus, a baking apparatus for baking the wafer after marking, an inspection apparatus for detecting and irradiating the portions marked by the marking apparatus, a loop-shaped conveying path for conveying the wafer along the receiving portion and each apparatus, And a conveying mechanism for conveying the wafer along the conveying path. The first passing mechanism passes the wafer between the wafer storage portion and the transfer mechanism, and the second passing mechanism passes the wafer between each device and the transfer mechanism. At the time of conveyance of the wafer, an enclosing member surrounding the wafer is provided along the conveying path, and the inside is kept in a clean air or a positive pressure atmosphere of nitrogen gas. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102438612-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220108248-A |
priorityDate | 1992-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947 |
Total number of triples: 25.