| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ecdfc9030125055f06a260938acdacab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec22a290a4e6eb9afc29333122e1a262 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D11-138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G05D11-13 |
| filingDate |
1997-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cfad5bbb38547e25a0d6af5cb2a4357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40f951c2a0be0bdb820a274d52a06aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a3cb42f73530b164f584a17fdf9778b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38fd2a9a629e504b3c270170a2c3898f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d013ee9a8cf3980b3c383bb2e58b8c6f |
| publicationDate |
2000-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100248500-B1 |
| titleOfInvention |
Resist Stripper Management System |
| abstract |
A device for managing a resist stripping liquid used for resist stripping in a semiconductor manufacturing process or a liquid crystal substrate manufacturing process, which controls the quality of a resist stripping solution at a constant level, reduces the amount of liquid used, reduces downtime, and reduces costs. do.n n n A resist release liquid discharge means for detecting the dissolved resist concentration of the resist release liquid by the absorbance spectrometer 16 and discharging the resist release liquid, and a liquid level of the resist release liquid by the liquid level gauge 3 And a first supply means for supplying distilled water and a second supply means for supplying at least one of the resist release stock solution and the distilled water by detecting the moisture concentration of the resist release liquid by the absorbance spectrometer 15. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100774069-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100489469-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100908200-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100390567-B1 |
| priorityDate |
1996-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |