| abstract |
The present invention relates to a tin oxide precursor, a silicon dioxide precursor and an accelerator [example; Triethyl phosphite] is chemically deposited on glass having a temperature of 450 to 650 ° C. at a deposition rate of 350 kW / sec or more to produce a coated glass article. The layer of deposited material, in combination with other layers, has special properties [eg, Controlled radiation, refractive index, wear resistance and appearance. |