http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100243491-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1996-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23a5ce805455d2776099d7a753b74684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddcc635330650d154e973d543cc4eba0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0e9f1c47e5a2cbdc1ba473da0fb5bbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f8ad21ce870fcc0162c5293bee8522d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a2bce75e903982c09453a197b4d65e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e53c085cc5c1dbc63d28e325d8a5bf9 |
| publicationDate | 2000-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100243491-B1 |
| titleOfInvention | New Sulfonium Salts and Chemically Amplified Forged Resist Materials |
| abstract | The sulfonium salt which is represented by following General formula (1), has at least 1 acid labile group in a phenyl group in a molecule, and has a linear, branched or cyclic electron withdrawing group substituted alkyl or aryl sulfonate is provided. .n n n n n n n n Wherein each R 1 is the same or different and is an alkyl group, an alkoxy group or a dialkylamino group; OR 2 is an acid labile group; Y is a straight, branched or cyclic alkyl or aryl sulfo having 2 to 20 carbon atoms In the case of an alkyl group, in the case of an alkyl group, one or two or more of the hydrogen atoms bonded to the carbon atom after its β position are substituted with an electron withdrawing group such as fluorine and a nitro group, and in the case of an aryl group, one of the hydrogen atoms of the benzene ring is used. Or two or more are substituted with an electron withdrawing group such as fluorine, nitro group, n is an integer of 0 to 2, m is an integer of 1 to 3, n + m is 3, r is 1 or more and 5 or less P is an integer of 0-5, q is an integer of 0-4, q + r is an integer of 1-5).n n n The novel sulfonium salt of the general formula (1) according to the present invention can increase the dissolution contrast of the exposed portion and the unexposed portion, and furthermore, at the time of exposure, substituted alkyl which is a weak acid as compared to trifluoromethanesulfonic acid, which is a conventionally generated acid, and the like. Alternatively, since aryl sulfonic acid is generated, the effect of loss of activity due to side reactions or neutralization of the generated acid by basic compounds from the resist film surface in the PEB process after exposure can be reduced, and since it is not as weak as alkylsulfonic acid, it is relatively sensitive. It is good and effective as a component of a chemically amplified forged resist material having high resolution suitable for fine processing technology. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100986658-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100553263-B1 |
| priorityDate | 1995-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 247.