http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100243490-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1996-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddcc635330650d154e973d543cc4eba0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23a5ce805455d2776099d7a753b74684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0e9f1c47e5a2cbdc1ba473da0fb5bbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e53c085cc5c1dbc63d28e325d8a5bf9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bb95b65e0f0d271c16f9ac076f58a19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b413974f6779badfe705fed23c862d8e |
| publicationDate | 2000-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100243490-B1 |
| titleOfInvention | New Sulfonium Salts and Chemically Amplified Forged Resist Materials |
| abstract | The sulfonium salt which is represented by following General formula (1), has at least 1 acid labile group in a phenyl group in a molecule, and has a linear, branched, or cyclic alkylsulfonate is provided.n n n n n n n n Wherein each R 1 is the same or different and is an alkyl group, an alkoxy group or a dialkylamino group; OR 2 is an acid labile group; Y is a straight, branched or cyclic alkylsulfonate having 1 to 20 carbon atoms In the structure may comprise a C═O carbonyl double bond, a COC ether bond or an alcoholic hydroxy group; n is an integer from 0 to 2, m is an integer from 1 to 3, and n + m is 3 r is an integer of 1 or more and 5 or less, p is an integer of 0-5, q is an integer of 0-4, q + r is an integer of 1-5). The novel sulfonium salt of the general formula (1) according to the present invention can increase the dissolution contrast of the exposed portion and the unexposed portion, and furthermore, at the time of exposure, the alkyl sulfonic acid is weak acid compared to the trifluoromethanesulfonic acid, which is a conventionally generated acid. Because of this, the effect of loss of activity due to side reactions or neutralization of generated acids by basic compounds from the surface of the resist film in the PEB process after exposure can be reduced, and a chemically amplified forged resist having high resolution suitable for fine processing technology. It is effective as a component of a material. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101421743-B1 |
| priorityDate | 1995-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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