http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100228467-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1997-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1999-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_234f320334f9a97fe9e39a3fe7148a86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18b9bb0a77851e8c61d9987130e2a8f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8e054927dda4762faf969d5e11a8f87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfae59e959d199a8d35045973e8bd022 |
| publicationDate | 1999-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100228467-B1 |
| titleOfInvention | Chemically amplified forged resist materials |
| abstract | (A) an organic solvent, (B) a polymer having a weight average molecular weight of 3,000 to 30,000 represented by the formula (1) as the base resin, (C) an acid generator, or a compound having two or more vinyl ether groups in the molecule (D) As a chemically amplified forged resist material comprising a.n n n [Formula 1]n n n n n n n n In formula, R < 1> is a hydrogen atom or a methyl group, R < 2> is a following formulan n n [Formula 2]n n n n n n n n R 3 is an acid labile group different from R 2 , R 4 and R 5 are each independently a hydrogen atom or a linear or branched alkali group of C 1 to C 6 , and R 6 Is a C 11 to C 10 linear, branched or cyclic alkyl group, or R 4 and R 5 , R 4 and R 6 or R 5 and R 6 may form a ring, and when forming a ring, R 4 , R 5 and R 6 each independently represent a C 1 to C 6 linear or branched alkylene group, and x and y are each 0 or a positive number, and x and y do not become 0 at the same time, and z is Positive, x, y, z are 0≤x / (x + y + z) ≤0.5, 0≤ / (x + y + z) ≤0.5, 0.4≤z / (x + y + z) ≤0.9 Satisfy the relationship.n n n The resist material of the present invention is a chemically amplified positive resist material, which is sensitive to high energy rays, particularly KrF excimer laser and X-rays, and is excellent in sensitivity, resolution, and plasma etching resistance, and also excellent in heat resistance of the resist pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100931617-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990006907-A |
| priorityDate | 1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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