| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-22 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 |
| filingDate |
1997-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f46824e3c65af2ef862753632a46424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84b990d5b4022aaa97ef661938bc84cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5044f29841bd858a264d0bb9cee21b47 |
| publicationDate |
1999-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100226263-B1 |
| titleOfInvention |
How to make screen mask of plasma display panel |
| abstract |
The present invention discloses a method of manufacturing a screen mask of a plasma display panel. The screen mask fabrication method of the plasma display panel according to the present invention is a screen mask fabrication method used in a screen printing process for forming a printed layer such as a partition, a dielectric layer, and an electrode on a transparent substrate of a plasma display panel. Applying a photoresist to the film; Exposing and developing the coated photoresist to form a photoresist pattern exposing a predetermined portion of the screen mesh; Forming a plating film on the screen mesh on which the photoresist pattern is not formed by an electroplating method; And removing the photoresist pattern. |
| priorityDate |
1997-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |