http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100221514-B1

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publicationDate 1999-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100221514-B1
titleOfInvention Apparatus and method for in-situ monitoring film thickness changes
abstract Film thickness changes on the lower body, such as semiconductor substrates, are in-situ monitored by inducing current in the film, and when the film thickness changes (increases or decreases), a change in current is detected. Due to the conductive film, the eddy current is induced in the film by generating alternating electromagnetic fields using a sensor including a capacitor and an inductor.
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Total number of triples: 26.