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filingDate 1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7900033e1c51bdf365a02541a4b27c9
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publicationDate 1999-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100220951-B1
titleOfInvention Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranylether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranylether-vinyl acetate copolymer And their production method
abstract The present invention relates to a novel photoresist material that can be used in the far ultraviolet region as vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranylether-vinyl acetate copolymer, vinyl 4-tetrahydropyra Nyloxybenzal-vinyl tetrahydropyranylether-vinyl acetate copolymer and its manufacturing method are provided. The copolymer of the present invention exhibited very low absorbance in the far-ultraviolet region, showing excellent transparency, and improved dry etching resistance by the acetal structure of the main chain and the acetal structure of the substituent.
priorityDate 1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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