http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100214111-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
filingDate 1992-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3edb3695bb18d4f7e2edbce27b43fe98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c8d24a0bcb822902894ead9cafba49f
publicationDate 1999-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100214111-B1
titleOfInvention How to Form a Patterned Coating Film Over an Electronic Device
abstract The present invention relates to a method of forming a patterned coating on a substrate, in particular on an electronic device, by negative resist technology. The method is characterized by applying a pre-ceramic coating comprising a hydrogen silsesquioxane resin and an initiator on a substrate and then coating the coating in a selected area for a time sufficient to cure the resin. The uncured coating is then washed and removed to leave only the patterned coating.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102155966-B1
priorityDate 1991-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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