http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100213202-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 1996-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_114021345ba3de3aa2fd2333768cf423
publicationDate 1999-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100213202-B1
titleOfInvention Plasma Forming Device and Etching Method of Semiconductor Device Using the Same
abstract The present invention relates to a plasma forming method and an etching method of a semiconductor device using the same. In the present invention, a high frequency generator is applied to the etching chamber through a coil antenna wound around an outer wall of the etching chamber in an etching process for manufacturing a semiconductor device. The helicon wave plasma forming apparatus which supplies the high frequency current supplied and the DC current supplied from a direct current supply means together is used. According to the present invention, the configuration of the helicon wave plasma forming apparatus can be made simpler by omitting the electromagnet from the structure of the helicon and the plasma forming apparatus.
priorityDate 1996-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224

Total number of triples: 20.