| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f9af914ed2fb00cd4f1b8b1a28964e4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-3452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4676 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1494
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-4292 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1995-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54fc583966d66475d16a6a5da3930ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59c5719aa699473b35d39eeaff9e753c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f80e8212560f2a0affa6502bd088780 |
| publicationDate |
1999-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100192934-B1 |
| titleOfInvention |
Method for preparing photosensitive resin and liquid photosensitive resin composition |
| abstract |
The present invention is characterized by reacting a bifunctional epoxy resin (B) having two epoxy groups in one molecule with respect to a carboxyl group in the resin (A) having two or more (meth) acryloyl groups and one or more carboxyl groups in one molecule. It relates to a method for producing a photosensitive resin having a. Since the photosensitive resin of the form in which the resin (A) was made into high molecular weight linearly through the bifunctional epoxy resin (B) is obtained, the resist film excellent in adhesiveness can be formed. In addition, the resist film after light irradiation can be developed quickly and accurately with alkaline aqueous solution. Therefore, the high performance liquid photosensitive resin composition useful for forming the black matrix and color filter of a soldering resist, electroless plating resist, or liquid crystal display panel for printed wiring board manufacture can be provided. Moreover, the coating film after photocuring by the liquid photosensitive resin composition which has Tg polymer fine particle of 20 degrees C or less has the advantage that it has the outstanding adhesiveness, even if it receives a thermal history. |
| priorityDate |
1994-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |