http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-0180067-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7bfa85af1830c787658ed46492874c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fe50a62ae3626294c694eb180ba8122d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-444 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1995-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1999-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab801f98646eec01472dc73d8a7ee368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25005a7b8163419c0a45ef90aa2c147a |
| publicationDate | 1999-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-0180067-B1 |
| titleOfInvention | Bismaleimide, a manufacturing method thereof and an ultraviolet photosensitive material using the same |
| abstract | [purpose]n n n It is an object of the present invention to provide bismaleimide, a method for producing the same, and a photosensitive material using the same as a light-sensitive polymer having excellent resolution.n n n [Configuration]n n n 1. Photosensitive bismaleimide (Ⅰ)n n n n n n n n 2. In the presence of nitrogen gas, maleic anhydride dissolved in a solvent was added to p-aminophenol and reacted at about 20 DEG C to obtain an amic acid solution. To this, a mixture of phosphorus pentaoxide and sulfuric acid was added. After warming it at about 70 ℃, it was quenched and precipitated to obtain NHPMI. Then, acetone and 4-aminobenzoic acid were added and mixed, and a solution of acetone dissolved in maleic anhydride was dissolved in acetic anhydride at low temperature. Then, sodium acetate was added thereto and reacted under heating, and the reaction product was quenched in water to obtain N- (carboxyphenyl) maleimide. Then, m-cresol was added to dissolve it, followed by SOCℓ 2 at low temperature, followed by constant reaction at room temperature. The reaction product was precipitated, filtered and dried with a solvent, dissolved in pyridine, and then dissolved in pyridine. N- (hydroxyphenyl) malee Imide is added and bismaleimide obtained by reacting under heating is obtained.n n n 3. Bismaleimide is dissolved in a solvent to prepare a photoresist, which is spin-coated with a spin coater, dried, and coated with a bismaleimide film to obtain an ultraviolet photosensitive material. |
| priorityDate | 1995-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.