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filingDate 1992-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1998-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_752126136ab79d160860ee814da8d303
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publicationDate 1998-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-0151162-B1
titleOfInvention Solar cell anti-reflection film formation method
abstract The present invention relates to an anti-reflection film that improves efficiency including simplification of the manufacturing process by spray coating while reducing the use material and varying the heat treatment and simultaneous spray conditions when forming the anti-reflection film of the solar cell. In forming the antireflection film, when spray coating the preheated wafer using a solution containing titanium isopropoxide and n-butyl acetate as an antireflection material, the spray pressure of the solution is 40 [psi] and the solution is The material pressure to deliver to the gun is 10 [inches water], and the table index is 1.0 [inches] which shows the distance the wafer advances with each stroke of the gun. stroke], spray coating with a traverse speed of 1-15 [inches / sec] that represents the speed at which the spray gun traverses the wafer. A description of a manufacturing method of a solar cell by forming an antireflection film that.
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priorityDate 1992-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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