http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-0144226-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-61 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1995-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1998-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-0144226-B1 |
| titleOfInvention | Positive Photoresist Composition |
| abstract | The positive photoresist composition consisting of the film formation agent cresol noblock resin and the photosensitive agent quinonediazido group-containing compound is added without limiting the amount of the hydroxyalkyl-substituted pyridine compound, thereby avoiding the problem caused by the sublimation material from the resist layer during the pattern process. A significant improvement can be obtained in the stability of the composition by tight bonding and storage of the resist layer as the substrate surface. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102266916-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102266915-B1 |
| priorityDate | 1994-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 96.