http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2021009980-A1

Outgoing Links

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filingDate 2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2021009980-A1
titleOfInvention Photocurable composition, method for manufacturing uneven structure, method for forming fine uneven pattern and uneven structure
abstract A photocurable composition used for forming a resin layer of an uneven structure including a substrate and a resin layer provided on the substrate and having fine irregularities formed on the surface thereof. The surface free energy of the cured film of this photocurable composition measured based on the Kitazaki-Hata theory is 15 mJ / m 2 to 40 mJ / m 2 , and the hardness measured using a nanoindenter is 0. It is 05 GPa to 0.5 GPa.
priorityDate 2019-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011024421-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012109514-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012018043-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017006664-A1
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Total number of triples: 32.