| abstract |
The present invention provides a sensitive light-sensitive or radiation-sensitive resin composition having excellent LER performance and ability to suppress collapse. In addition, a resist film, a pattern forming method, and a method for manufacturing an electronic device are provided. The sensitive light-sensitive or radiation-sensitive resin composition of the present invention comprises an acid-decomposable resin having a repeating unit represented by the general formula (1) and a compound that generates an acid by irradiation with active light or radiation. include. |