abstract |
It contains a base material component (A) whose solubility in a developing solution is changed by the action of an acid, and the base material component (A) has a high molecular weight having a structural unit (a1) represented by the following formula (a1-1). A resist composition containing a molecular compound (A1). (In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or an alkyl halide group having 1 to 5 carbon atoms, Vax1 is a single bond or a divalent linking group, and na0 is 0 to 2. R01 is a methyl group or an ethyl group.) [Chemical formula 1] |