http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020054291-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-14 |
filingDate | 2019-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2020054291-A1 |
titleOfInvention | Chemical solution |
abstract | The present invention provides a chemical solution having excellent organic residue inhibitory property and roughness inhibitory property. The chemical solution of the present invention is a chemical solution used for manufacturing a semiconductor device containing an oxidizing agent and a solvent, and the chemical solution further comprises a group consisting of an alkane having 12 to 50 carbon atoms and an alkene having 12 to 50 carbon atoms. It contains one or more selected organic components, and the content of the organic component is 0.10 to 1,000,000 mass ppt with respect to the total mass of the drug solution. [Selection diagram] None |
priorityDate | 2018-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 88.