abstract |
Provided is a sensitive light-sensitive or radiation-sensitive resin composition having excellent exposure latitude. Further, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device using the above-mentioned sensitive light-sensitive or radiation-sensitive resin composition. We also provide new resins. The actinic light-sensitive or radiation-sensitive resin composition contains a repeating unit represented by the following formula (1), and contains a resin whose polarity is increased by the action of an acid. |