Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C211-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C209-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-28 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C211-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C209-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-62 |
filingDate |
2019-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2021-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-WO2019225541-A1 |
titleOfInvention |
Hypochlorous acid quaternary alkylammonium solution, its manufacturing method and semiconductor wafer cleaning method |
abstract |
PROBLEM TO BE SOLVED: To provide a method for producing a quaternary alkylammonium hypochlorite solution having excellent storage stability. SOLUTION: The preparation step of preparing a quaternary alkylammonium hydroxide solution and the reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine are included. The carbon dioxide concentration in the gas phase portion in the reaction step is 100 volume ppm or less, and the pH in the liquid phase portion in the reaction step is 10.5 or more. A method for producing a quaternary alkylammonium solution of hypochlorous acid. [Selection diagram] Fig. 1 |
priorityDate |
2018-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |