| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D201-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L39-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3415
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-127 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L39-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3415 |
| filingDate |
2019-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2019198749-A1 |
| titleOfInvention |
Conductive compositions, conductive films and laminates |
| abstract |
The conductive composition of the present invention contains a conductive polymer (A) having an acidic group and a basic compound (B) having a cyclic amide and an amino group in the molecule. The conductive film of the present invention is formed from the conductive composition. The laminate of the present invention includes a base material, an electron beam resist layer formed on at least one surface of the base material, and the conductive film formed on the electron beam resist layer. |
| priorityDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |