http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019187804-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2019-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019187804-A1 |
| titleOfInvention | Sensitive light or radiation sensitive resin composition, sensitive light or radiation film, pattern forming method, method of manufacturing electronic device, and polyester. |
| abstract | Provided is an actinic cheilitis or radiation-sensitive resin composition capable of obtaining a good pattern shape while having a high followability of an immersion liquid to an exposure apparatus. The sensitive light-sensitive or radiation-sensitive resin composition contains a resin having a group which is decomposed by the action of an acid and whose polarity is increased, a polyester, and a photoacid generator, and the polyester contains a group having an active proton and an active proton. It is an anionic group in which the active proton is dissociated from the group having the active proton, and has a group forming a salt structure with the cation, or a group having a group having the active proton protected by a protective group. |
| priorityDate | 2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 195.