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filingDate 2019-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2019167461-A1
titleOfInvention Photocurable composition for imprint containing polymer
abstract PROBLEM TO BE SOLVED: To provide a novel photocurable composition for imprint containing a polymer. A photocurable composition for imprint containing the following component (a), the following component (b), the following component (c), the following component (d) and the following component (e). (A): Surface-modified silica particles having a primary particle diameter of 1 nm to 100 nm (b): An alicyclic (meth) acrylate monomer (c) having at least one (meth) acryloyloxy group in one molecule: urethane. (Meta) acrylate compound or epoxy (meth) acrylate compound (d): Polymer (e) having a repeating structural unit represented by the following formula (1) and a repeating structural unit represented by the following formula (2): photoradical Initiator [Chemical Formula 1] (In the formula, R1 and R2 independently represent a methyl group or a hydrogen atom, A1 represents an alkyl group having 1 to 8 carbon atoms, and A2 represents a single bond or 1 to 4 carbon atoms. Represents the alkylene group of, X represents a polymerizable group having one or more (meth) acryloyloxy groups, and Z1 represents a divalent group.) [Selection diagram] None.
priorityDate 2018-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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