http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019155692-A1

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filingDate 2018-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2019155692-A1
titleOfInvention Manufacturing method of synthetic resin skin material
abstract Forming a skin material-forming laminate having a base fabric, an adhesive layer, and a skin layer containing a resin having a softening point of 145 ° C. or more on one surface of the base fabric in this order; With respect to the obtained laminate for forming a skin material, an embossing roll having irregularities on the skin layer side and a backup roll on the base fabric side are brought into contact with each other, and the heating temperature of the embossing roll is A (° C.), When the heating temperature of the backup roll is B (° C.), A and B satisfy the conditions (I) [130 ° C. ≦ A ≦ 180 ° C.], the condition (II) [180 ° C. ≦ B ≦ 250 ° C.] and the condition ( III) Embossing under a temperature condition satisfying [softening point of resin contained in skin layer−15 ° C. ≦ A <softening point of resin contained in skin layer]; Forming a concave portion having a distance of 250 μm or more from the top surface of the convex portion The manufacturing method of a synthetic resin skin material having a.
priorityDate 2018-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 23.