http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019146378-A1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-18 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D251-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D251-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D405-14 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D405-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D471-06 |
filingDate | 2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2019146378-A1 |
titleOfInvention | Composition for forming a resist underlayer film, a resist underlayer film and a method for forming the same, and a method for producing a patterned substrate. |
abstract | Provided are a composition for forming a resist underlayer film capable of forming a resist underlayer film having excellent etching resistance, heat resistance, flatness and film defect suppression, a resist underlayer film, a method for forming a resist underlayer film, and a method for producing a patterned substrate. The purpose. The present invention is a composition for forming a resist underlayer film containing a compound having a group represented by any of the following formulas (1-1) to (1-3) and a solvent. In the following formulas (1-1) to (1-3), * and ** refer to sites of the above compound that bind to a portion other than the groups represented by the above formulas (1-1) to (1-3). Shown. a and b are independently integers of 0 to 3. When a is 0, b is 1 or more. When a is 1 or more, b is 0. |
priorityDate | 2018-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.