| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-0008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-168 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08 |
| filingDate |
2019-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2019142788-A1 |
| titleOfInvention |
Processing liquid for semiconductor wafers containing hypochlorite ions |
| abstract |
【Task】 An object of the present invention is to provide a treatment liquid and a cleaning method for removing ruthenium and tungsten adhering to an end face portion and a back surface portion of a semiconductor wafer. SOLUTION: A treatment liquid for cleaning a semiconductor wafer, which contains (A) hypochlorite ion and (C) solvent and has a pH of more than 7 and less than 12.0 at 25 ° C. Provided is a method for cleaning a semiconductor wafer by removing ruthenium and tungsten from the semiconductor wafer by bringing the treatment liquid into contact with a semiconductor wafer having ruthenium or tungsten. [Selection diagram] None |
| priorityDate |
2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |