http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019107271-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J201-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J11-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-10 |
| filingDate | 2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019107271-A1 |
| titleOfInvention | A resin composition having plasma resistance and an electrostatic chuck device using the same. |
| abstract | PROBLEM TO BE SOLVED: To provide a resin composition having remarkably improved plasma resistance regardless of the type of matrix resin, and an electrostatic chuck device using the same. SOLUTION: A resin composition used in an environment where it is directly or indirectly exposed to plasma, and is a filler of a resin as a matrix and a layered inorganic compound having ion exchange properties dispersed in the resin as a matrix. A resin composition comprising the resin and the layered inorganic compound in an amount of 1 to 90% by volume, and an electrostatic chuck device using the resin composition. [Selection diagram] Fig. 1 |
| priorityDate | 2017-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.