http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019054478-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-264 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-106 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-264 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y70-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-165 |
| filingDate | 2018-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019054478-A1 |
| titleOfInvention | Near-infrared curable ink composition, near-infrared curable film, their manufacturing method, and stereolithography |
| abstract | A near-infrared curable ink composition, a near-infrared curable film, and the near-infrared curable ink composition containing composite tungsten oxide fine particles having sufficient near-infrared absorption ability and excellent adhesion to a substrate. The stereolithography method used is provided. A near-infrared curable ink composition containing a composite tungsten oxide having a near-infrared absorbing ability and an uncured thermocurable resin, wherein the composite tungsten oxide contains a hexagonal crystal structure, and the composite tungsten The lattice constants of the oxide are 7.3850 Å or more and 7.4186 Å or less on the a-axis, 7.5600 Å or more and 7.6240 Å or less on the c-axis, and the average particle size of the composite tungsten oxide is 100 nm or less. Provided is a photomolding method using a cured film and the near-infrared ray curable ink composition. |
| priorityDate | 2017-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 143.