abstract |
Provided is a siloxane resin composition having excellent adhesiveness and fine pattern workability. A siloxane resin (A) having a structure represented by the following general formula (1), a structure represented by the following general formula (2) and a structure represented by the following general formula (3), and having an unsaturated double bond. A siloxane resin composition containing a compound (B), a photopolymerization initiator (C) and a solvent (D). [Chemical 1] (In the general formulas (1) to (3), R 1 , R 2 and R 3 each independently represent hydrogen, a hydroxy group, a group having a siloxane bond or a monovalent organic group having 1 to 30 carbon atoms. Represents an alkenyl group, an alkynyl group, a monovalent organic group having a nitrogen atom and a carbon-oxygen unsaturated bond or a monovalent organic group having a cyclic ether bond, and Y represents a photoradical-polymerizable group (provided that it is an alkenyl group. A monovalent organic group having a group and an alkynyl group), Z represents a monovalent organic group having an alkali-soluble group, and a, b and c each independently represent an integer of 1 or more. When c is 2 or more, plural R 1 , R 2 , R 3 , X, Y and Z may be the same or different.) |