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filingDate 2018-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2018220946-A1
titleOfInvention Multi-stage etching method for resin surface and plating method for resin using the same
abstract In etching the resin surface, without performing the resin swelling process, The following steps (a) and (b), (A) treating with a solution containing an oxidizing agent, and adsorbing the oxidizing agent on the resin surface; (b) activating the oxidizing agent adsorbed on the resin surface in step (a) as one set; The present invention provides a new resin etching technique that does not use chromic acid and can be operated at an industrial level by a method of etching a resin surface characterized by performing a set or more.
priorityDate 2017-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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