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filingDate 2018-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2018198936-A1
titleOfInvention Transparent substrate with low reflection film, photoelectric conversion device, coating liquid for forming low reflection film of transparent substrate with low reflection film, and method of manufacturing transparent substrate with low reflection film
abstract The transparent substrate with a low reflection film of the present invention includes a transparent substrate and a low reflection film formed on at least one main surface of the transparent substrate. The low reflection film is a porous film in which solid silica fine particles having an average particle diameter of 80 to 150 nm are fixed by a binder containing silica as a main component. The binder further includes an aluminum compound. The content of the component in the low reflection film is 55 to 70% in terms of mass%, silica fine particles in the binder are 25 to 40%, and the aluminum compound is 0.1 to 1.5% in terms of Al 2 O 3 in terms of Al 2 O 3 . The organic component is 0.25 to 3%. The film thickness of the low reflection film is 80 to 800 nm. The transmittance gain defined as an increase in the average transmittance in the wavelength region of the transparent substrate with a low-reflection film, relative to the average transmittance in the wavelength region of 380 to 850 nm of the transparent substrate in a state where the low-reflection film is not formed, 2.5% or more. The organic component includes at least one selected from the group consisting of β ketoesters and β diketones.
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