http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018168309-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2018168309-A1 |
| titleOfInvention | Radiation-sensitive resin composition, pattern film and method for producing the same, pattern substrate, cell culture instrument, microchannel device, and method for producing cell mass |
| abstract | [Problem] To provide a radiation-sensitive resin composition capable of suppressing an acid or base generated during pattern formation from adversely affecting cells. [Solution] A polymer (A) having a structural unit (I) represented by the formula (1) and at least one radiation-sensitive compound selected from a radiation-sensitive acid generator and a radiation-sensitive base generator (B). In formula (1), R 1 is a hydrogen atom, a methyl group or a trifluoromethyl group, R 2 and R 3 are each independently an alkyl group or an aryl group having 1 to 5 carbon atoms, R 4 and R 5 are each independently a C 1 to C 10 alkanediyl group, X is a carbanion (-COO - group), a sulfo anion (-SO 3 - group), or a phosphate anion, Q is , An oxygen atom, an ester bond, an amide bond, an arylene group, an alkanediyl group having 1 to 10 carbon atoms, or a combination of these groups. |
| priorityDate | 2017-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 292.