| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2018-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2018168252-A1 |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method |
| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition having a small pattern line width fluctuation (LWR) when a pattern is formed, a resist film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, And a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by the following general formula (I) upon irradiation with actinic ray or radiation. (I) |
| priorityDate |
2017-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |