http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018074358-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D105-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L5-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2017-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2018074358-A1 |
| titleOfInvention | Aqueous solution for resist pattern coating and pattern forming method using the same |
| abstract | 【Task】 A novel aqueous solution for resist pattern coating is provided. [Solution] Component A: cyclodextrin selected from the group consisting of α-cyclodextrin, β-cyclodextrin and γ-cyclodextrin, or a derivative of the cyclodextrin, component B: a solvent containing water as a main component, and optionally component C The organic sulfonic acid represented by the following formula (2) or a salt thereof is included, and the content ratio of the component A is 0.1% by mass to 10% by mass with respect to 100% by mass of the entire aqueous solution. Or the content rate of the salt is 0.01 mass% thru | or 50 mass% aqueous solution for resist pattern coating with respect to 100 mass% of said A component. [Chemical 1] (Wherein R 4 represents an alkyl group or a fluorinated alkyl group, or an aromatic group having at least one substituent, and M + represents a hydrogen ion, an ammonium ion, a pyridinium ion, or an imidazolium ion.) [Selection] Figure 1 |
| priorityDate | 2016-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.