http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018061944-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-55 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2017-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2018061944-A1 |
| titleOfInvention | Actinic radiation sensitive or radiation sensitive resin composition, pattern forming method and method of manufacturing electronic device |
| abstract | (A) A resin containing a repeating unit (a) represented by the following general formula (1), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) an actinic ray containing an organic solvent And radiation sensitive resin compositions are provided. The actinic ray-sensitive or radiation-sensitive resin composition has a solid content concentration of 4% by mass or less. (Wherein, R 11 and R 12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R 13 represents a hydrogen atom, a halogen atom, or a monovalent organic group, or Alternatively, it is a single bond or an alkylene group and is bonded to L or Ar in the formula to form a ring L represents a single bond or a divalent linking group Ar represents an aromatic ring group. n represents an integer of 2 or more.) [Chemical formula 1] |
| priorityDate | 2016-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.