http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017179727-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C62-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-25 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017179727-A1 |
| titleOfInvention | Radiation sensitive resin composition, resist pattern forming method and radiation sensitive acid generator |
| abstract | The present invention includes a polymer having a first structural unit containing an acid-dissociable group, a first radiation-sensitive acid generator, and a solvent, wherein the first radiation-sensitive acid generator is a bridge-like bond. A radiation-sensitive resin composition that is a first compound having a first ring containing, and at least two second rings that condense at least one side with the first ring. The present invention also includes a polymer having a first structural unit containing an acid-dissociable group, a first radiation-sensitive acid generator, and a solvent, wherein the first radiation-sensitive acid generator is carbon. Sensitivity that is a compound derived from a 1,4-adduct of a compound having a carbon double bond or carbon-carbon triple bond and -CO- or -SO 2- to a compound represented by the following formula (A) It is a radiation resin composition. |
| priorityDate | 2016-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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