http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017169288-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2017-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017169288-A1 |
| titleOfInvention | Radiation-sensitive composition and pattern forming method |
| abstract | The radiation-sensitive composition of the present invention contains particles containing a metal oxide as a main component, a radiation-sensitive acid generator, and an acid scavenger, and the content of silicon atoms with respect to all metal atoms in the composition Is less than 50 atomic%. As content with respect to the total solid in the composition of the said radiation sensitive acid generator, 1 to 40 mass% is preferable. As content with respect to the total solid in the composition of the said acid capture body, 1 to 40 mass% is preferable. The average particle diameter of the particles is preferably 20 nm or less. The pattern forming method of the present invention includes a step of forming a film by applying the radiation-sensitive composition described above to a substrate, a step of exposing the film, and a step of developing the exposed film. Prepare. The developer used in the development step is preferably an alkaline aqueous solution. The developer used in the development step may be an organic solvent-containing solution. The radiation used in the exposure step may be extreme ultraviolet rays or electron beams. |
| priorityDate | 2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 356.