http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017163910-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017163910-A1 |
| titleOfInvention | Polishing composition |
| abstract | A polishing composition capable of sufficiently removing defects remaining on the surface of a polished polishing object and capable of substantially equalizing the polishing rate of each material when polishing a polishing object including a plurality of materials. Offer things. A polishing composition for use in polishing an object to be polished, comprising a material having a silicon-silicon bond, a material having a silicon-nitrogen bond, and a material having a silicon-oxygen bond. A polishing composition comprising an organic acid surface-fixed silica particle, a wetting agent, and a polishing rate inhibitor for the material having a silicon-silicon bond, and having a pH of less than 7. [Selection figure] None |
| priorityDate | 2016-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.